Workshops Mechanical

Drop Saw W.F. Wells

Machine Specifications:
Capacity: Rectangular at 90° 17″ High x 20″ Wide,
Round at 90° 17″ Diameter
Weight Capacity: 5,000 lbs
Please check the file Specifications in file tab for more details.
Website:
https://wfwells.com/products/semi-automatic-twin-post/model-f-16-3/

W.F.WELLS INC
F-16-3
Building 4, Level 0 West
Workshops Harbor

Alpha 1460XS CNC Lathe

460mm swing, 11kW spindle motor, 1500mm between centres. Cutting edge design and construction quality. Uses high performance cast iron with Warren-type construction for maximum strength and optimum
swarf clearance.
For more detrails please refer to Datasheet in Files tab
Website: https://www.colchester.co.uk/

Colchester Harrison
ALPHA 1460 XS
Building 27, Level 2
Imaging and Characterization Core Lab Physical Characterization

Bruker D8 Twin

Automatically switch between Bragg-Brantano optics and parallel optics

Bruker
D8 Advance A25
Building 3, Level 0 West
Imaging and Characterization Core Lab Physical Characterization

Bruker D8 Eiger

IuS microfocus X-ray source with Eiger 2D detector

Bruker
D8 Discover A25
Building 3, Level 0 West
Imaging and Characterization Core Lab Physical Characterization

Bruker D8 Venture

X-ray Diffractometer for single crystal structure determination.
Sample - single crystal.

Bruker
D8 Venture
Building 3, Level 0 West
Imaging and Characterization Core Lab Physical Characterization

Bruker D2 Phaser

X-ray Diffractometer - XRD - for phase identification at room temperature.
Sample - powders.

Bruker
D2 Phaser 2 Gen
Building 3, Level 0 West
Imaging and Characterization Core Lab Optical Microscopy

Olympus BX41

Upright micrscope for fluorescence, DIC and brightfeild epifluorescence imaging.
Sample - standard sample on microscope slide, transparent or non-transparent sample but with fluorescence.

Olympus
BX43F
Building 3, Level 0 West
Imaging and Characterization Core Lab Optical Microscopy

Nikon SMZ 25

Stereomicroscope offers 25:1 zoom range, bright and high contrast fluorescent images.
Sample - standard sample on microscope slide, transparent or non-transparent sample but with fluorescence.

Nikon Instruments Inc.
SMZ25
Building 3, Level 0 West
Imaging and Characterization Core Lab Optical Microscopy

Olympus Material Microscope BX61

Epifluorescence imaging with phase contrast.
Sample - on standard microscope slide or wafer.

Olympus
U-AFAZM-VIS
Building 3, Level 0 West
Imaging and Characterization Core Lab Optical Microscopy

ZEISS 7MP Multiphoton microscope

Multiphoton imaging
Sample - standard microscope slide.

Carl Zeiss
Axio Examinar Z1, Up
Building 3, Level 0 West
Imaging and Characterization Core Lab Optical Microscopy

ZEISS Airyscan Inverted Confocal

The microscope is an inverted confocal microscope system with Airyscan detector

Carl Zeiss
Axio Observer.Z1
Building 3, Level 0 West
Imaging and Characterization Core Lab Optical Microscopy

Leica AF7000 live cell system

Live cell imaging and TIRF epifluorescence imaging.
Sample - standard microslide, petri dish.

Leica
DMI6000 B
Building 3, Level 0 West
Imaging and Characterization Core Lab Optical Microscopy

Multiphoton Microscope

Multiphoton imaging

Carl Zeiss
Axio Observer Z1, Up
Building 3, Level 0 West
Imaging and Characterization Core Lab Optical Microscopy

Leica SP8 STED system

Confocal microscope with STED and hyvolution function and light sheet module.

Leica
TCS SP8
Building 3, Level 0 West
Imaging and Characterization Core Lab Surface Science

Spectroscopic Ellipsometer ER FGMS

Spectroscopic Ellipsometer capable of measuring the following properties of a thin film sample with a thickness from 1A to >45um: a) optical constants (n,k) for isotropic, anisotropic, and graded films; b) surface and interface roughness; c) derived optical properties such as absorption coefficient and optical bandgap including optical constants and film thickness (raw data).
Sample - thin films.

Horiba Jobin Yvon
Uvisel
Building 3, Level 0 West
Imaging and Characterization Core Lab Surface Science

SIMS

Dynamic SIMS equipment for elemental identification of extreme surface or depth of various devices with a sensitivity down to ppb . This instrument is capable of detecting all elements in periodic table, from hydrogen to uranium, including their corresponding isotopes. It is equipped with oxygen and argon guns that can produce intense and focused ion beams. Oxygen is ideal for the analysis of electropositive elements with the highest sensitivity. Using specific protocols based on reference samples, the quantification of elements present with concentration lower than a few percent (typically from 10-6 1 %) can be easily achieved. For elements present with higher concentration (matrix effect regime), the SIMS workstation has the capability to ionizing neutral emitted species using an electron impact source (SNMS) whose generated ions are analyzed using a MAXIM quadrupole spectrometer with an available mass range of up to 510u. The SIMS instrument is also equipped with an oxygen flooding capability to improve the depth resolution (~ 5nm) during depth profiling of specific devices.
Sample - solid samples only with a maximum dimension of 1 x 1 x 0.5cm.

Kratos/Hiden
N/A
Building 3, Level 0 West
Imaging and Characterization Core Lab Surface Science

Surface Profiler

Advanced thin and thick film step height measurement tool capable of profiling surface topography and waviness, and measuring surface roughness in the nanometer range. This compact system is capable of measuring steps below 10 nm with a step-height repeatability of 0.6 nm. The instrument is equipped with 3D mapping capability allowing to record a surface contour data in three dimensions (X, Y, and Z).
Sample - solids with a dimension of up to 6 x 6 x 4 inches. Films made of soft material may be difficult to measure using this instrument.
the new instrument Dektak XT is already installed and the old Dektak 150 will be kept as spare until further decision

Bruker-Veeco
Dektak 150
Building 3, Level 0 West
Imaging and Characterization Core Lab Surface Science

Spectroscopic Ellipsometer LT AGMS

Spectroscopic Ellipsometer capable of measuring the following properties of a thin film sample with a thickness from 1A to >45um: a) optical constants (n,k) for isotropic, anisotropic, and graded films; b) surface and interface roughness; c) derived optical properties such as absorption coefficient and optical bandgap including optical constants and film thickness (raw data).
Sample - thin films.

Horiba Jobin Yvon
Uvisel
Building 3, Level 0 West
Imaging and Characterization Core Lab Surface Science

XPS Amicus

X-ray Photoelectron Spectroscopy - XPS -capable of analysing the following properties a) elemental composition/quantification (survey spectra); b) chemical composition (low resolution spectra, raw data depth profile). It is equipped with an achromatic X-ray source and dual Al-Mg anode.
Sample - powders or films with a dimension of 0.6 cm X 0.6 cm, weigh >20 mg with no oil content.

Kratos Analytical
AMICUS
Building 3, Level 0 West
Imaging and Characterization Core Lab Surface Science

Agilent 5500 SPM

Scanning Probe Microscope - SPM - capable of measuring the following characteristics of sample surface: a) 3D topography, to measure roughness and step height; b) Lateral Force Microscopy - LFM - to measure frictional properties; c) Magnetic Force Microscopy - MFM - to map magnetic domain; d) current sensing Atomic Force Microscopy - AFM - to measure conductivity distribution; e) IV curve; f) Electrostatic Force Microscopy - EFM - to qualitatively measure local static charge domain and charge carrier density; g) Kelvin Force Microscopy - KFM - to quantitatively measure surface potential; h) Piezoresponse Force Microscopy - PFM - to measure electromechanical properties of piezoelectric and ferroelectric materials; i) Force Spectroscopy, to measure polarity and strength of the interaction between AFM tip and sample; j) Scanning Tunneling Microscopy - STM - to measure topography using tunneling current.
Sample - thin films, nanoparticles and nanowire with maximum structure height of 8 �m. Nanoparticles and nanowires have to be fixed on flat substrate.

Agilent Technologies
5500 SPM
Building 3, Level 0 West