Nanofabrication Core Lab Thinfilms

Furnace Box KSL-1700X

This is a front loading box-type oven for high temperature application up to 1700 deg-C under atmosphere environment. Maximum heating rate is 10 deg-C/min.
Sample - a wide range of solids or powders.

MTI Corporation
KSL-1700X
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Furnace Tube 1200C_3Z

This is a three zone furnace tube used for syntheses or purifications of compounds. The maximum working temperature is 1200 degC and the maximum continuous temperature is 1100 degC. Ar, H2, O2 and N2 gases or vacuum pump are provided to this furnace tube.Sample - solid materials with maximum dimension of 7 cm, not applicable for liquids.

NBD KJ
Three Zone-1200C
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Furnace Tube 1200C_2Z

This is a two zone furnace tube that is used for heat treatment, syntheses or purifications of compounds. The maximum working temperature is 1200 degC and the maximum continuous temperature is 1100 degC. Ar, N2 and O2 gases are provided to this furnace tube.Sample - solid materials with maximum dimension of 7 cm, not applicable for liquids.

KMT Furnace
OTF1200XII
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Glove Box_2

To prepare air sensitive samples under Ar atmosphere.
Sample -Hazardous, corrosive or explosive chemicals are not allowed.

MBRAUN
MB200B
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Glove Box_1

To prepare air sensitive samples under Ar atmosphere.
Sample - Hazardous, corrosive or explosive chemicals are not allowed.

MBRAUN
MB200B
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Hydraulic Press PP25

The hydraulic press uses pressure force of up to 25 ton to form solid high quality pellets from powders. The sample is placed between polished pressure plates and the press applies the necessary pressure to the sample via the die. The dies are available in several diameters.
Sample - a wide range of solids or powders.

Retsch
PP25
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Hot-press

The PP25 is a compact unit for the preparation of solid, high-quality pellets with heating and pressing processes at temperatures up to 200 degC. The maximum pressure is 25 t.
Sample - a wider range of solid materials.

Carver
4389
Building 3, Level 2 West
Nanofabrication Core Lab Cleanroom

DEP-019 Ion Beam Assist Sputter

Sputtering is a physical vapor deposition process in which positively charged ions generated in plasma are accelerated by an electrical field to strike the negative target with sufficient energy to dislodge and eject atoms from the target. The ejected atoms condense on substrate to form a thin film. Sputter machine is capable of depositing thin metallic and insulation layers less than 300 nm. The sputtering system has three magnetron sputtering cathodes which accommodate 2 inch diameter targets and can be used with DC or RF sputtering.
Sample - a wide range of metal materials, not applicable for powders, polymers, organics, carbon or toxic materials. Substrate maximum diameter is 8 inches and thickness 1 cm.

ESC
ESCRD4
Building 3, Level 0 West
Nanofabrication Core Lab Thinfilms

DEP-008 High Performance Ebeam EvaporatorTF

E-beam evaporator is a physical vapor deposition (PVD) technique, where an intense electron beam is emitted from a filament to strike a source material and vaporize it within a vacuum environment. The vaporized atoms condense on the substrate to form a thin film. The e-beam evaporator has the capability to deposit up to four different materials (metal and oxide) without opening the chamber. The lab provides standard materials such as Zirconium, Indium, Tungsten, Copper, Titanium, Iron, Aluminum and Rhodium.
Sample - a wide range of solid materials, not applicable for polymers, powders, organics and toxic materials. Maximum sample diameter is 200 mm, maximum substrate temperature is 400 degC.

Denton Vacuum, LLC
Explorer 14
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

DEP-022 Inkjet Printer

Microfabrication technology to print polymer patterns on a substrate by using an inkjet printing system for MEMS and microelectronics applications. This bottom-up fabrication method uses small fluid droplet sprayed directly on the substrate to build microstructures. The printing fluids are often UV-curable, heat-sensitive or conductive polymers for various applications. The resolution of the structure is limited by the size of droplet or nozzle, usually within a range of 25-125m diameter. The quality of the printing system determines the speed and precision of the spray and stage control. This technology has various applications including optical interconnect, electrical devices, microfluidic structures and assembly.
Sample - a wide range of inks.

Microfab Technologies
Jetlab II
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Drying Box Oven 200C_2

Thermal processing of materials at temperatures up to 200 degC in air.
Sample - a wide range of solids or powders, and not applicable for volatile, fuming or degassing materials.

Yamato Scientific
DVS402
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Drying Box Oven 200C_1

Thermal processing of materials at temperatures up to 200 degC in air.
Sample - a wide range of solids or powders, and not applicable for volatile, fuming or degassing materials.

Yamato Scientific
DVS402
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Furnace Box 1200C_2

For materials thermal processing such as annealing, sintering etc., up to 1200 degC in air.
Sample - Hazardous, sublimating, fuming, flammable or explosive chemicals are not allowed.

Thermo Fisher
BF1732BC-1/Lindberg Blue M
Building 3, Level 2 West
Nanofabrication Core Lab Thinfilms

Furnace Box 1200C_1

For materials thermal processing such as annealing, sintering etc., up to 1200 degC in air.
Sample - Hazardous, sublimating, fuming, flammable or explosive chemicals are not allowed.

Thermo Fisher
BF1732BC-1/Lindberg
Building 3, Level 2 West
Coastal and Marine Resources Core Lab Marine Operations

Vertical net with structure 0007

Plankton nets
DIAMETER 600
MICRAS 100

KC Denmark
VERTICAL PLANKTON NET KC DENMARK
Building 27, Level 2
Nanofabrication Core Lab Thinfilms

d33 meter

To measure piezoelectric coefficient d33 at room temperature.
Sample - a wide range of solids.

Sinocera
YE2730A
Building 3, Level 2 West
Coastal and Marine Resources Core Lab Marine Operations

Vertical net with structure 0008

Plankton nets
DIAMETER 600
MICRAS 100

KC Denmark
VERTICAL PLANKTON NET KC DENMARK
Building 27, Level 2
Coastal and Marine Resources Core Lab Marine Operations

Vertical net with structure 0009

Plankton nets
DIAMETER 600
MICRAS 100

KC Denmark
VERTICAL PLANKTON NET KC DENMARK
Building 27, Level 2
Coastal and Marine Resources Core Lab Marine Operations

Vertical net with structure 0010

Plankton nets
DIAMETER 750
MICRAS 200

KC Denmark
VERTICAL PLANKTON NET KC DENMARK
Building 27, Level 2
Coastal and Marine Resources Core Lab Marine Operations

Plankton net with structure 0001

Plankton nets
DIAMETER 400
MICRAS 150

KC Denmark
VERTICAL PLANKTON NET KC DENMARK
Building 27, Level 2